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Title:
スルホン酸エステル基を有する高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4240202
Kind Code:
B2
Abstract:
A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance

Inventors:
原田 裕次
畠山 潤
河合 義夫
笹子 勝
遠藤 政孝
岸村 眞治
前田 一彦
小森谷 治彦
宮澤 覚
Application Number:
JP2003032584A
Publication Date:
March 18, 2009
Filing Date:
February 10, 2003
Export Citation:
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Assignee:
信越化学工業株式会社
パナソニック株式会社
セントラル硝子株式会社
International Classes:
C08F28/02; C07C309/67; C08F212/14; C08F220/12; C08F232/00; G03F7/004; G03F7/027; G03F7/039; H01L21/027
Domestic Patent References:
JP2004002725A
JP2004165595A
JP2004244439A
JP4198939A
JP2000231194A
JP2002327013A
JP2002322217A
JP2002293840A
JP200467975A
JP2004145048A
Foreign References:
WO2003025675A1
Attorney, Agent or Firm:
小島 隆司
重松 沙織
小林 克成
石川 武史