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Title:
転写用マスクの製造方法、及び転写用マスク基板
Document Type and Number:
Japanese Patent JP4245900
Kind Code:
B2
Inventors:
雨宮 勲
Application Number:
JP2002321771A
Publication Date:
April 02, 2009
Filing Date:
November 05, 2002
Export Citation:
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Assignee:
HOYA株式会社
International Classes:
H01L21/027; B81C99/00; G03C5/00; G03F1/20; G03F9/00
Domestic Patent References:
JP2003124090A
Foreign References:
WO2004003985A1
Attorney, Agent or Firm:
藤村 康夫



 
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