Title:
露光方法とそれを用いた半導体装置の製造方法
Document Type and Number:
Japanese Patent JP4255677
Kind Code:
B2
Inventors:
Koichi Nagai
Application Number:
JP2002320375A
Publication Date:
April 15, 2009
Filing Date:
November 01, 2002
Export Citation:
Assignee:
Fujitsu Microelectronics Limited
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP7326563A | ||||
| JP2000277426A | ||||
| JP59060439A | ||||
| JP8264409A | ||||
| JP2002075815A | ||||
| JP2000269120A | ||||
| JP10171097A |
Attorney, Agent or Firm:
Keizo Okamoto