To provide a thin film EL element with a dielectric layer and a sol-gel dielectric layer added thereto, having low cost, good productivity, no defect and high reliability by preventing the removal of the sol-gel dielectric film deposited on a unnecessary portion due to the addition of the sol-gel dielectric layer and the separation or breakage of a lower electrode layer due to the separation of the sol-gel dielectric film deposited on the unnecessary portion during processing.
The thin film EL element comprises an electrically insulating substrate, the lower electrode layer having a pattern on the substrate, the dielectric layer for covering at least part of the lower electrode layer, and at least a luminous layer and an upper electrode layer laminated on the dielectric layer, at least one of the lower and upper electrode layers being a transparent electrode layer, the dielectric layer having a layered structure including the dielectric layer formed by at least solution coating firing. A thin film EL element manufacturing method comprises calcining the dielectric layer formed by the solution coating firing at a non-crystallizing temperature, followed by patterning and firing. The thin film EL element is manufactured in this method.
COPYRIGHT: (C)2004,JPO
Minoru Okoba
Masashi Miwa
Yukihiko Shirakawa
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Masakazu Noda
Ikeda adult