プラズマCVD装置 - KABUSHIKI KAISHA KOBE SEIKO SHO

Title:

プラズマCVD装置

Document Type and Number:

Japanese Patent JP4268195

Kind Code:

B2

Abstract:

The plasma CVD apparatus of the present invention comprises a pair of deposition rolls 2 and 3 disposed oppositely in parallel so that a substrate S wound thereon faces each other; a magnetic field generating member 12 and 13 provided inside each of the deposition rolls 2 and 3, which generates a magnetic field so as to converge plasma to the vicinity of a roll surface thereof facing a space 5 between the deposition rolls; a plasma power source 14 with polarity alternately reversing between one electrode and the other electrode; a gas supply pipe 8 for supplying a film-forming gas to the space 5; and evacuation means for evacuating the space. One electrode of the plasma power source 14 is connected to one deposition roll 2, and the other electrode thereof to the other deposition roll 3.

Inventors:

Hiroshi Tamagaki

Application Number:

JP2007031585A

Publication Date:

May 27, 2009

Filing Date:

February 13, 2007

Export Citation:

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