Title:
蒸気段を含む三段水素処理方法
Document Type and Number:
Japanese Patent JP4283997
Kind Code:
B2
Abstract:
A three stage hydroprocessing process includes two liquid and one vapor reaction stages, with a hydrogen containing vapor effluent produced in both liquid stages. The second liquid stage vapor effluent comprises part of the first liquid stage feed and the first liquid stage vapor effluent is the feed for the vapor stage. At least a portion of the hydrogen for the first liquid stage and vapor stage reactions is respectively provided by the hydrogen in the second and first liquid stage vapor effluents.
Inventors:
Gupta, Ramesh
Jung, Henry
Ellis, Edward, Stanley
Mark Ray, Gerald, Edward
Jung, Henry
Ellis, Edward, Stanley
Mark Ray, Gerald, Edward
Application Number:
JP2000547181A
Publication Date:
June 24, 2009
Filing Date:
April 30, 1999
Export Citation:
Assignee:
EXXON RESEARCH AND ENGINEERING COMPANY
International Classes:
C10G51/02; C10G35/00; C10G65/02; C10G35/10; C10G45/00; C10G55/02; C10G57/00; C10G65/00; C10G69/02
Domestic Patent References:
| JP8041466A | ||||
| JP4224890A | ||||
| JP8027468A |
Foreign References:
| US5705052 |
Attorney, Agent or Firm:
Kenji Kawabi