Title:
結晶質シリコン膜の作製方法
Document Type and Number:
Japanese Patent JP4293412
Kind Code:
B2
Inventors:
Hiroshi Shibata
Shinji Maekawa
Shinji Maekawa
Application Number:
JP2002079291A
Publication Date:
July 08, 2009
Filing Date:
March 20, 2002
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
G02F1/1368; H01L21/20; H01L21/322; H01L21/336; H01L29/786
Domestic Patent References:
| JP9181325A | ||||
| JP2001308334A | ||||
| JP2002005857A | ||||
| JP9199420A | ||||
| JP11354448A |