反射型マスクブランクス及びその製造方法、反射型マスク

Title:

反射型マスクブランクス及びその製造方法、反射型マスク

Document Type and Number:

Japanese Patent JP4320050

Kind Code:

B2

More Like This:

JPS63293820	MANUFACTURE OF MASK FOR X-RAY EXPOSURE
JPH0626246	[Name of invention] A mask that forms a pattern on a lacquer layer by X-ray lithography.

Inventors:

Lol Ki Tsutomu
Ken Kinoshita
Hosoya Morio

Application Number:

JP2003276467A

Publication Date:

August 26, 2009

Filing Date:

July 18, 2003

Export Citation:

Assignee:

HOYA CORPORATION

International Classes:

G03F1/22; G03F1/24; H01L21/027

Domestic Patent References:

Attorney, Agent or Firm:

Takeshi Otsuka

Previous Patent: JPS4320049

Next Patent: 制振装置及び該装置を備えた斜張橋