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Title:
投影露光装置、投影露光装置に使用されるレチクル、投影露光方法及び半導体デバイス製造方法
Document Type and Number:
Japanese Patent JP4328572
Kind Code:
B2
Inventors:
竹中 務
三浦 聖也
Application Number:
JP2003194940A
Publication Date:
September 09, 2009
Filing Date:
July 10, 2003
Export Citation:
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Assignee:
キヤノン株式会社
International Classes:
G03C5/00; G03F1/46; G03F7/22; G03F9/00; H01L21/027
Domestic Patent References:
JP4346349A
JP6097052A
JP7078740A
JP8101495A
JP8123007A
JP10012526A
JP2002280297A
Foreign References:
WO2000058761A1
US20020132171
Attorney, Agent or Firm:
西山 恵三
内尾 裕一



 
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