Title:
ウエーハの洗浄装置及びウエーハの洗浄方法
Document Type and Number:
Japanese Patent JP4337616
Kind Code:
B2
Inventors:
Hideki Munakata
Application Number:
JP2004132837A
Publication Date:
September 30, 2009
Filing Date:
April 28, 2004
Export Citation:
Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
JP8316182A | ||||
JP10050657A | ||||
JP9017763A | ||||
JP2001210703A |
Attorney, Agent or Firm:
Mikio Yoshimiya