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Title:
ウエーハの洗浄装置及びウエーハの洗浄方法
Document Type and Number:
Japanese Patent JP4337616
Kind Code:
B2
Inventors:
Hideki Munakata
Application Number:
JP2004132837A
Publication Date:
September 30, 2009
Filing Date:
April 28, 2004
Export Citation:
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Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
JP8316182A
JP10050657A
JP9017763A
JP2001210703A
Attorney, Agent or Firm:
Mikio Yoshimiya



 
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