Title:
プラズマを用いた処理用ガスのための装置
Document Type and Number:
Japanese Patent JP4339588
Kind Code:
B2
Abstract:
Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for making the gas to be treated flow through the said structure in a region in which the amplitude of the electric field associated with the incident wave is high. The means for making the gas flow comprise a plasma torch for producing a plasma in the gas. The torch comprises an injector made of an electrically conducting material mounted on a first large face of the said structure and extending so as to project through an orifice made in a second large face opposite the said first large face. A gap for passage of the incident waves lies around the injector.
Inventors:
Moisan, michel
Zakurzewski, Zenon
Keroac, Daniel
Rostang, Jean-Christophe
Zakurzewski, Zenon
Keroac, Daniel
Rostang, Jean-Christophe
Application Number:
JP2002538460A
Publication Date:
October 07, 2009
Filing Date:
October 23, 2001
Export Citation:
Assignee:
Rail Liquide-Societe Anonym Pools Retude e Rex Prosatation de Procede Georges Claude
International Classes:
H05H1/30; B01J19/08; H01J37/32; H05H1/34
Domestic Patent References:
| JP59132600A | ||||
| JP2000237580A | ||||
| JP60202700A | ||||
| JP7306191A | ||||
| JP2000189745A | ||||
| JP9022794A | ||||
| JP6096895A | ||||
| JP2000133494A | ||||
| JP63270469A | ||||
| JP3022400U | ||||
| JP3067496A | ||||
| JP60087200U | ||||
| JP5021195A | ||||
| JP1158193A |
Other References:
L. Bardos, H. Barankova and S. Berg,Microwave sufatron system for plasma processing,J. of Vacuum Science & Technology A,米国,American Vacuum Society,1996年 4月,Vol. 14, No. 2,page 474-477
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Sadao Muramatsu
Ryo Hashimoto