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Title:
金属析出装置
Document Type and Number:
Japanese Patent JP4342386
Kind Code:
B2
Abstract:

To provide an apparatus for an oxidation-reduction reaction, which makes the oxidation-reduction reaction efficiently proceed without using high voltage applied from the outside.

This apparatus for the oxidation-reduction reaction has an electrode pair 1 consisting of a semiconductor layer 2 which is used as an anode and is formed of diamond doped with high-concentration boron and a semiconductor layer 3 which is used as a cathode, is formed of such diamond doped with high-concentration boron as to have a higher work function than the semiconductor layer 2 has, and is placed on the other face of the semiconductor layer 2 while being electrically connected to the semiconductor layer 2. Here, the semiconductor layer 3 is prepared so as to have a different work function from that of the semiconductor layer 2, by 0.03 to 9 eV. The electrode pair 1 is then immersed in a solution 4 containing cations and anions.

COPYRIGHT: (C)2006,JPO&NCIPI


Inventors:
Yoshihiro Yokota
Nobuyuki Kawakami
Takeshi Tachibana
Kazushi Hayashi
Koji Kobashi
Application Number:
JP2004188862A
Publication Date:
October 14, 2009
Filing Date:
June 25, 2004
Export Citation:
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Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO
International Classes:
C25C1/00; C25C7/02
Domestic Patent References:
JP5190530A
JP2000226682A
JP2003290767A
JP2001089887A
JP2003073876A
JP2002164042A
Attorney, Agent or Firm:
Masanori Fujimaki



 
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