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Title:
イメージセンサ
Document Type and Number:
Japanese Patent JP4369885
Kind Code:
B2
Abstract:
A buried oxide is provided in a substrate of a photodiode so as to be opposed to a cathode and is in contact with a lower end of a depletion layer. The buried oxide is polarized owing to charges forming the depletion layer and thus works as a capacitor. A capacitor formed in the depletion layer and the additional capacitor made by the buried oxide are, therefore, connected in series, which reduces a total junction capacitance Cs. Increase in photo-detection voltage Vs results in according to an equation, Vs=Qp/Ct, since an amount of photocharge Qp is constant. The increase in the photo-detection voltage Vs allows an improvement in the SN ratio of the photodiode. Further, easy formation of the buried oxide, for example, by implanting oxygen ions, permits low-cost manufacturing of the photodiode.

Inventors:
Sumitaka Goto
Application Number:
JP2005072261A
Publication Date:
November 25, 2009
Filing Date:
March 15, 2005
Export Citation:
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Assignee:
Seiko Instruments Inc.
International Classes:
H01L31/10; H01L27/146
Domestic Patent References:
JP2004111762A
JP2004179217A
JP8139356A
JP8139355A
JP62016568A
JP2001320078A
Attorney, Agent or Firm:
Yoshiharu Matsushita



 
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