露光方法および装置 - FUJIFILM Corporation

Title:

露光方法および装置

Document Type and Number:

Japanese Patent JP4376693

Kind Code:

B2

Abstract:

In a photolithography method for performing photolithography with an exposing section that has a plurality of exposing head arrays arranged in the sub-scanning direction, cost reductions are achieved by extending the operation life of the exposing light sources and replacement cycles. Irradiation of the exposing light beams by the exposing head arrays is initiated or terminated on an array by array basis by drive controlling the exposing light sources constructed to output the exposing light beams, and if the irradiation coverage of an exposing head array is out of the photosensitive material, the laser modules are drive controlled such that the irradiation of the exposing light beams by the exposing head array is terminated.

Inventors:

Akihiro Hashiguchi

Application Number:

JP2004135893A

Publication Date:

December 02, 2009

Filing Date:

April 30, 2004

Export Citation:

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