Title:
光情報記録媒体薄膜製造用スパッタリングターゲット並びに光情報記録媒体及びその製造方法
Document Type and Number:
Japanese Patent JP4376868
Kind Code:
B2
Abstract:
A sputtering target formed from a material obtained by adding B 2 O 3 to an In 2 O 3 -ZnO-SnO 2 system compound oxide having SnO 2 as its primary component, wherein the sputtering target is formed from oxide composed with the respective element ratios being In/(In + Zn + Sn + B) = 0.01 to 0.41, Zn/(In + Zn + Sn + B) = 0.02 to 0.45, Sn/(In + Zn + Sn + B) = 0.13 to 0.81, and B/(In + Zn + Sn + B) = 0.09 to 0.66.
Inventors:
Hideo Takami
Masataka Yahagi
Masataka Yahagi
Application Number:
JP2005517893A
Publication Date:
December 02, 2009
Filing Date:
July 29, 2004
Export Citation:
Assignee:
Nikko Metal Co., Ltd.
International Classes:
C23C14/34; C04B35/01; C04B35/16; C04B35/457; C23C14/08; G11B7/24; G11B7/254; G11B7/257; G11B7/26
Domestic Patent References:
| JP2000256059A | ||||
| JP2000256061A | ||||
| JP11322413A |
Attorney, Agent or Firm:
Isamu Ogoshi