Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
並列カークパトリック・バエズ光学素子を備えた、X線方向付けシステム、X線反射システム及びX線光学素子
Document Type and Number:
Japanese Patent JP4391019
Kind Code:
B2
Abstract:
An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

More Like This:
JP2008197593TRANSMISSION TYPE DIFFRACTION GRATING FOR X-RAY, X-RAY TALBOT INTERFEROMETER AND X-RAY IMAGING APPARATUS
WO/2018/133969OPTICAL ARRANGEMENT, PARTICULARLY A LITHOGRAPHY SYSTEM
Inventors:
Gutman, George
Gian, Rikai
Berman, Boris
Application Number:
JP2000532855A
Publication Date:
December 24, 2009
Filing Date:
February 18, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Osmic, Inc.
International Classes:
G21K1/06
Domestic Patent References:
JP8271697A
JP9500453A
JP10170699A
JP5288898A
Other References:
James H.Underwood et al,“X-ray microscope with multilayer mirrors”,Applied Optics ,米国,1986年 6月 1日,Vol.25,No.11,p.1730-1732
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukio Iwamoto
Yutaka Yoshida



 
Previous Patent: 急冷気相重合反応器における準流動化粒子床のための攪拌装置

Next Patent: 光度計並びに混合方法および混合用キュベット