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Title:
エポキシトリアゾール化合物の製造方法及びその中間体
Document Type and Number:
Japanese Patent JP4404611
Kind Code:
B2
Abstract:
The present invention provides a compound of the formula (I); wherein Ar represents difluorophenyl group, which is useful as an intermediate in a process for producing an epoxytriazole compound of the formula (VII); wherein Ar represents difluorophenyl group, which is a synthetic intermediate of antifungal agents. The present invention also provides a process for producing a compound of the formula (VII) which comprises epoxydation step, deprotection step, reaction step with a compound represented by RSO 2 X, and reaction step with 1,2,4-triazole; or comprises epoxydation step, reaction step with 1,2,4-triazole, deprotection step, reaction step with a compound represented by RSO 2 X and treatment step by a base.

Inventors:
Wang Iki
Tetsuya Ikemoto
Application Number:
JP2003398252A
Publication Date:
January 27, 2010
Filing Date:
November 27, 2003
Export Citation:
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Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C49/84; C07C45/00; C07C45/64; C07D249/08; C07D303/22; C07D405/06
Domestic Patent References:
JP4074168A
JP3128338A
JP4356471A
Foreign References:
WO2003068758A1
Other References:
Chem. pharm. Bull.,1993年,41(6),P1035-1042
Thedora W.Greene,PROTECTIVE GROUPS IN ORGANIC SYNTHESIS,米国,John Wiley & Sons, Inc.,1999年 8月16日,P48-55,60-63
Chem. Pharm. Bull,1996年,44(2),P314-327
Attorney, Agent or Firm:
Takashima Ichi



 
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