To provide a manufacturing method of a pattern forming body by which a characteristic of a region not directly irradiated with energy is also changed when a pattern with changed characteristic is formed by semiconductor photocatalyst action associated with energy irradiation by exposing from a base material side of a substrate for patterning where a light shielding section is formed.
The substrate for patterning has a base material, the light shielding section formed on the base material and a semiconductor photocatalyst-containing layer which is formed on the base material so as to cover the light shielding section and which contains at least a semiconductor photocatalyst and a binder. The manufacturing method of the pattern forming body has an energy irradiation process in which a reflection plate and the semiconductor photocatalyst-containing layer of the substrate for patterning are arranged to face each other and the energy irradiation is made from a base material side to form the pattern in which the characteristic of the semiconductor photocatalyst-containing layer is changed to a stripe shape. In the energy irradiation process, reflection energy from the reflection plate irradiating the semiconductor photocatalyst-containing layer is in parallel with some angle to incident energy and further is parallel to the pattern with changed characteristic.
COPYRIGHT: (C)2006,JPO&NCIPI
Uno Yusuke
Takashi Sawada
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Kishimoto Tatsuto