Title:
マスク装置及び真空成膜装置
Document Type and Number:
Japanese Patent JP4417019
Kind Code:
B2
Abstract:
To provide equipment for mask capable of continuously performing deposition of a plurality of patterns at a high speed, and a vacuum deposition system.
The equipment for mask has a mask mounting section 60a which can freely attachably and detachably mount masks 30 for deposition to and from a substrate 7 in a deposition position and a mask housing section 62 which has first to third housing sections 64 to 66 in which the masks 30 are housed. The equipment is so constituted as to move the prescribed masks 30 between the mask mounting section 60a and the mask housing section 62 by using a mask exchange robot.
COPYRIGHT: (C)2005,JPO&NCIPI
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Inventors:
Hideyuki Odagi
Application Number:
JP2003084797A
Publication Date:
February 17, 2010
Filing Date:
March 26, 2003
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/12; C23C14/04; C23C14/24; H05B33/10; C23C14/56; H01L51/50; H05B33/14
Domestic Patent References:
| JP10121241A | ||||
| JP61180160U | ||||
| JP11158605A |
Attorney, Agent or Firm:
Hideki Abe
Shigeo Ishijima
Shigeo Ishijima