Title:
フォトレジスト組成物、その方法及びそれらを含有してなる工業製品
Document Type and Number:
Japanese Patent JP4421707
Kind Code:
B2
Abstract:
The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.
Inventors:
James F Cameron
James Michael Mori
George W. Orsula
Gangu Shu
Yoshimoto Yamamoto
James Michael Mori
George W. Orsula
Gangu Shu
Yoshimoto Yamamoto
Application Number:
JP25206499A
Publication Date:
February 24, 2010
Filing Date:
August 04, 1999
Export Citation:
Assignee:
Rohm and Haas Electronic Materials, L.L.C.
International Classes:
G03F7/039; G03F7/004; H01L21/027
Domestic Patent References:
| JP10010715A | ||||
| JP9222732A | ||||
| JP10039500A | ||||
| JP10048814A | ||||
| JP10087724A | ||||
| JP11167200A | ||||
| JP2000029215A |
Attorney, Agent or Firm:
Norio Saeki