Title:
超高真空走査型プローブ顕微鏡
Document Type and Number:
Japanese Patent JP4431733
Kind Code:
B2
Inventors:
Daisuke Fujita
Keiko Onishi
Toshihiko Nagamura
Ichiro Sugiyama
Keiko Onishi
Toshihiko Nagamura
Ichiro Sugiyama
Application Number:
JP2004322873A
Publication Date:
March 17, 2010
Filing Date:
November 05, 2004
Export Citation:
Assignee:
National Institute for Materials Science
Unisoku Co., Ltd.
Unisoku Co., Ltd.
International Classes:
G01Q30/02; G01B21/30; G01N3/20; G01N27/04; G01Q30/08; G01Q30/10; G01Q30/16; G01Q30/20
Domestic Patent References:
| JP11503516A | ||||
| JP59131046U | ||||
| JP8088179A | ||||
| JP2000241332A | ||||
| JP2078902A | ||||
| JP2004271301A | ||||
| JP2005037361A |
Other References:
Oliver Schaff et al,In-situ STM studies of strain-stabilized thin-film dislocation networks under applied stress,Materials Science and Engineering,ELSEVIER,2001年,Vol. A319-A321,p914 - p918
TH. FRIES et al,IN SITU SCANNING TUNNELING MICROSCOPY OF THREE-POINT BENDING INVESTIGATIONS,Acta metall. mater.,1994年,Vol. 42, No. 9,p3129 - p3136
TH. FRIES et al,IN SITU SCANNING TUNNELING MICROSCOPY OF THREE-POINT BENDING INVESTIGATIONS,Acta metall. mater.,1994年,Vol. 42, No. 9,p3129 - p3136
Attorney, Agent or Firm:
Toshio Nishizawa