Title:
感光性ポリイミド
Document Type and Number:
Japanese Patent JP4434338
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a negatively photosensitive polyimide which is soluble in a general-purpose low-boiling org. solvent typified by methyl ethyl ketone, has photosensitivity, and is developable with an aq. alkali soln. SOLUTION: This photosensitive polyimide is a copolymer of a diamine component comprising a diaminopolysiloxane, a hydroxyl-contg. or carboxyl- contg. diamine, and 1,4-bis[2-(3-aminobenzoyl)ethenyl]benzene and an acid anhydride component comprising an arom. tetracarboxylic dianhydride or a dicarboxylic anhydride which has a 2,5-dioxotetrahydrofuryl group as another acid anhydride group.
Inventors:
Erei Hagi
Masazo Hayashi
Masazo Hayashi
Application Number:
JP23017098A
Publication Date:
March 17, 2010
Filing Date:
July 31, 1998
Export Citation:
Assignee:
Nippon Mektron Co., Ltd.
International Classes:
C08G73/10; C08F299/02; G03F7/038
Domestic Patent References:
JP64123A | ||||
JP57131227A | ||||
JP5310933A |
Attorney, Agent or Firm:
Toshio Yoshida