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Title:
マイクロスイッチング素子製造方法およびマイクロスイッチング素子
Document Type and Number:
Japanese Patent JP4447940
Kind Code:
B2
Abstract:
A method is provided for making a micro-switching element. The switching element includes a substrate, two supporting members fixed to the substrate, and a movable beam bridging between the supporting members. The beam includes a membrane, a movable contact electrode and a movable driving electrode, both disposed on the membrane. The switching element also includes a pair of stationary contact electrodes facing the movable contact electrode, and a stationary driving electrode cooperating with the movable driving electrode for generation of electrostatic force. The method includes the steps of making a sacrifice layer on the substrate, making the membrane on the sacrifice layer, and subjecting the sacrifice layer to etching with the membrane intervening, so that the supporting members are formed as remaining portions of the sacrifice layer between the substrate and the membrane.

Inventors:
Tadashi Nakatani
Miyashita Tsutomu
Application Number:
JP2004055180A
Publication Date:
April 07, 2010
Filing Date:
February 27, 2004
Export Citation:
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Assignee:
富士通株式会社
International Classes:
H01H49/00; B81B3/00; B81B5/00; B81B7/00; B81C1/00; H01H11/00; H01H51/22; H01H59/00; H01L21/00; H01L29/00
Domestic Patent References:
JP2000208018A
JP8509093A
JP2002280470A
JP2000035591A
JP2003242873A
Foreign References:
WO2003054938A1
WO2002059977A1
Attorney, Agent or Firm:
Minoru Yoshida
Tatsuya Tanaka