Title:
露光装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4458322
Kind Code:
B2
Abstract:
An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.
Inventors:
Hiromichi Hara
Application Number:
JP2003005890A
Publication Date:
April 28, 2010
Filing Date:
January 14, 2003
Export Citation:
Assignee:
Canon Inc
International Classes:
F16F13/20; H01L21/027; G03B27/42; G03B27/58; G03B27/62; G03C5/18; G03C5/26; G03F7/20
Domestic Patent References:
| JP4136944A | ||||
| JP5306726A | ||||
| JP11257417A | ||||
| JP7173955A | ||||
| JP6066346A | ||||
| JP2002025903A | ||||
| JP2004063653A |
Attorney, Agent or Firm:
Yuichi Uchio