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Title:
シリコン膜のパターン形成方法
Document Type and Number:
Japanese Patent JP4462394
Kind Code:
B2
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Inventors:
Yoji Matsuki
Rui Ebata
Application Number:
JP2000117631A
Publication Date:
May 12, 2010
Filing Date:
April 19, 2000
Export Citation:
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Assignee:
JSR CORPORATION
International Classes:
C01B33/02; H01L21/208; C01B33/12; H01L21/20; H01L21/316
Domestic Patent References:
JP2000031066A
JP8032085A
JP11130867A
JP11176752A
Attorney, Agent or Firm:
Masataka Oshima



 
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