To provide a pattern preparation processor capable of efficiently designing a large two-dimensional (2D) pattern by developing a basic pattern two-dimensionally and repeatedly.

The pattern preparation processor prepares a pattern graphic mathematical model 1 capable of expressing the whole graphics of a 2D developed pattern by setting attribute information such as the arrangement, shapes and colors of respective pixels of a basic pattern as basic feature information and mathematically describing connections of vertical and horizontal patterns of pattern graphics of a repeated pattern formed by developing the basic pattern two dimensionally, the behavior of the mathematical model is mathematically scanned and pattern graphic data can be easily generated from the obtained data. The mathematical model is expressed as a commutative linear expression system.

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