Title:
半導体廃ガス処理用スクラバ
Document Type and Number:
Japanese Patent JP4468920
Kind Code:
B2
Abstract:
Disclosed is a scrubber for processing semiconductor waste gas produced in a semiconductor fabricating process, wherein the scrubber burns the waste gas with a flame of a high temperature, filters and captures particles produced after the waste gas is burnt, and discharges particle-filtered waste gas to the atmosphere. The semiconductor waste gas processing scrubber includes: a supply section for supplying semiconductor waste gas, fuel and oxygen; a burner connected to the supply section so as to burn the semiconductor waste gas by flame; a burning chamber joined to the burner so as to cause particles, which are produced as the semiconductor waste gas is burnt, to drop; a wet tower installed at a side of the burning chamber so as to cause the particles, which are transferred from the burning chamber after adsorbing the particles using water, to drop; and a water reservoir tank connected to the burning chamber and the wet tower so as to capture the particles which have dropped from the burning chamber and the wet tower.
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Inventors:
Lee Yeon Sun
Kim Hyun Katsu
Lee Sone
Kim Hyun Katsu
Lee Sone
Application Number:
JP2006172891A
Publication Date:
May 26, 2010
Filing Date:
June 22, 2006
Export Citation:
Assignee:
Clean Systems Korea Incorporated
International Classes:
B01D53/46; B01D47/06
Domestic Patent References:
| JP2005131509A | ||||
| JP2004278879A | ||||
| JP2003130327A | ||||
| JP2003126656A | ||||
| JP2003024741A | ||||
| JP2003019419A | ||||
| JP2002166127A |
Foreign References:
| US20040141900 |
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro