Title:
プラズマ処理装置
Document Type and Number:
Japanese Patent JP4470970
Kind Code:
B2
Abstract:
A plasma processing apparatus of the batch type includes a tubular process container having a closed end and an open end opposite to each other, and a process field for accommodating target substrates, the process container including a tubular insulating body. The apparatus further includes a holder configured to hold the target substrates at intervals, a loading mechanism configured to load and unload the holder into and from the process container, and a lid member connected to the loading mechanism and configured to airtightly close the open end. A first electrode is disposed at the closed end of the process container, and a second electrode is disposed at the lid member, to constitute a pair of parallel-plate electrodes. An RF power supply is connected to one of the first and second electrodes and configured to apply an RF power for plasma generation.
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Inventors:
Toshiki Takahashi
Application Number:
JP2007200114A
Publication Date:
June 02, 2010
Filing Date:
July 31, 2007
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/31; C23C16/505
Domestic Patent References:
| JP6077138A | ||||
| JP2002299329A |
Attorney, Agent or Firm:
Akihiro Asai