Title:
露光装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4528337
Kind Code:
B2
Abstract:
An exposure apparatus includes an optical path in which a plurality of optical units are arranged and which includes a portion of projecting a pattern of an original onto a substrate to expose the substrate to light, and a controller configured to monitor deteriorations, due to light, of the plurality of optical units, wherein the controller is configured to monitor each of a plurality of sections of the optical path each of which includes at least one optical unit, for deterioration of the at least one optical unit belonging to a corresponding section.
Inventors:
Akihisa Kaga
Ryo Kasai
Ryo Kasai
Application Number:
JP2008052580A
Publication Date:
August 18, 2010
Filing Date:
March 03, 2008
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP11260688A | ||||
| JP2006303193A | ||||
| JP2002208549A | ||||
| JP2000323396A | ||||
| JP7226353A | ||||
| JP2007173804A | ||||
| JP2000150343A |
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu