Title:
露光装置及びデバイス製造方法、メンテナンス方法及び露光方法
Document Type and Number:
Japanese Patent JP4548341
Kind Code:
B2
Abstract:
An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (LQ), and includes a liquid supply mechanism (10) for supplying the liquid (LQ), and a measuring device (60) which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped (10).
Inventors:
Kenichi Shiraishi
Application Number:
JP2005517784A
Publication Date:
September 22, 2010
Filing Date:
February 08, 2005
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2000058436A | 2000-02-25 | |||
| JPH10303114A | 1998-11-13 | |||
| JP2005064210A | 2005-03-10 | |||
| JP2003209092A | 2003-07-25 | |||
| JPH06124873A | 1994-05-06 |
Foreign References:
| WO1999049504A1 | 1999-09-30 | |||
| WO2004105107A1 | 2004-12-02 | |||
| WO2005020299A1 | 2005-03-03 |
Attorney, Agent or Firm:
Masatake Shiga