Title:
インジウムの回収方法
Document Type and Number:
Japanese Patent JP4549501
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for efficiently recovering indium from high purity indium oxide-containing scrap generated at the time of producing an ITO sputtering target or after its use. SOLUTION: This method for recovering indium includes a stage in which ITO indium-containing scrap is dissolved with hydrochloric acid to form an indium chloride solution, a stage in which a sodium hydroxide aqueous solution is added to the indium chloride solution to remove tin contained in the scrap as tin hydroxide and a stage in which indium is substituted with zinc and recovered from the remaining solution freed of the tin hydroxide.
Inventors:
Koichi Takemoto
Shunichiro Yamaguchi
Shunichiro Yamaguchi
Application Number:
JP2000256759A
Publication Date:
September 22, 2010
Filing Date:
August 28, 2000
Export Citation:
Assignee:
Nikko Metal Co., Ltd.
International Classes:
C01G19/00; C22B58/00; C22B3/04; C22B3/44; C22B3/46; C22B7/00; C22B25/00; C25C1/22; C25C7/06
Domestic Patent References:
| JP6065658A | ||||
| JP2000169991A | ||||
| JP5156381A | ||||
| JP10204673A | ||||
| JP2000128531A |
Attorney, Agent or Firm:
Isamu Ogoshi
Yohei Kinoshita
Yohei Kinoshita