Title:
濃度分布マスクの製造方法
Document Type and Number:
Japanese Patent JP4565711
Kind Code:
B2
Inventors:
Kazuhiro Umeki
Application Number:
JP2000225216A
Publication Date:
October 20, 2010
Filing Date:
July 26, 2000
Export Citation:
Assignee:
Ricoh Optical Co., Ltd.
International Classes:
G02B5/00; G03F1/68; G03F1/80; G03F7/20; G03F7/40
Domestic Patent References:
| JP7152140A | ||||
| JP9146259A | ||||
| JP4177346A | ||||
| JP58077231A | ||||
| JP7077796A |
Attorney, Agent or Firm:
Shigeo Noguchi