Title:
マイクロリソグラフィにおけるアラインメントとオーバーレイを改善するシステムおよび方法
Document Type and Number:
Japanese Patent JP4573873
Kind Code:
B2
Abstract:
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
Inventors:
Chelala, anschman
Sligny Vassan, Citrgata Vui
Addis Miri, Kranzy Mitra
Sligny Vassan, Citrgata Vui
Addis Miri, Kranzy Mitra
Application Number:
JP2007515571A
Publication Date:
November 04, 2010
Filing Date:
June 02, 2005
Export Citation:
Assignee:
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
International Classes:
H01L21/027; G03F7/20; G03F9/00
Domestic Patent References:
| JP6349702A | ||||
| JP9211872A | ||||
| JP20037597A |
Foreign References:
| US20030081193 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa