Title:
電子ビーム画像生成装置
Document Type and Number:
Japanese Patent JP4596351
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To realize still faster image formation with improvement of S/N ratio by enabling speeding up and delayed storage concerning an electron beam image formation device which forms images by applying electron beams on a sample. SOLUTION: A strip electron image formed by applying strip electron beams 12 on a sample 5 and by applying a bias voltage on the sample to invert the beams on or just before the surface of the sample is detected by a plurality of linear detecting elements 17, and at same time, the plurality of linear detecting elements arrayed in parallel are translated while scanning them in the orthogonal direction to strip electron beams for delayed storage to make up a high S/N ratio image, whereby, an image-making speed on the surface of the sample is heightened.
Inventors:
Anazawa
Application Number:
JP2000262990A
Publication Date:
December 08, 2010
Filing Date:
August 31, 2000
Export Citation:
Assignee:
Holon Co., Ltd.
International Classes:
H01J37/29; H01J37/28
Domestic Patent References:
| JP10255709A | ||||
| JP10197462A | ||||
| JP2000215841A | ||||
| JP2000067798A | ||||
| JP11108864A | ||||
| JP9270242A | ||||
| JP7249393A |
Attorney, Agent or Firm:
Morihiro Okada