Title:
多孔質半導体電極の形成方法及び色素増感型太陽電池用電極基板の製造方法
Document Type and Number:
Japanese Patent JP4601286
Kind Code:
B2
Abstract:
To provide a forming method of a porous semiconductor electrode, capable of forming a porous semiconductor electrode of a required shape under comparatively high productivity.
By an electric field jet method that is a method of discharging coating liquid by impressing voltage on an electrode fitted at a discharge outlet of the coating liquid or its vicinity, the coating liquid containing a large number of semiconductor fine particles is coated on a matter to be coated to form a coating film, and by fixing the semiconductor fine particles in the coating film on the matter to be coated, the porous semiconductor electrode is formed.
COPYRIGHT: (C)2005,JPO&NCIPI
Inventors:
Hiroki Nakagawa
Application Number:
JP2003379021A
Publication Date:
December 22, 2010
Filing Date:
November 07, 2003
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
H01L31/04; H01M14/00
Domestic Patent References:
| JP2002313443A | ||||
| JP2001276718A | ||||
| JP2000268891A |
Attorney, Agent or Firm:
Shunichi Yoshimura