多面取り用フォトマスク、電気光学装置の製造方法

Title:

多面取り用フォトマスク、電気光学装置の製造方法

Document Type and Number:

Japanese Patent JP4617650

Kind Code:

B2

Abstract:

To provide a multiple-production photomask equalizing opening sizes of patterns of a multiple-production substrate, a method for manufacturing an electrooptical device, and electronic equipment with the electrooptical device manufactured by the manufacturing method mounted thereon.

The multiple-production photomask 1 has a plurality of mask regions 2, each mask region 2 has a plurality of opening parts 3. When the multiple-production mask 1 is a positive type, the size of opening part 3 in each mask region 2 is made larger in steps from the center part to the outer periphery.

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Inventors:

Tomotaka Yamagata

Application Number:

JP2003335534A

Publication Date:

January 26, 2011

Filing Date:

September 26, 2003

Export Citation:

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