Title:
水酸基を有する単量体、高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4623324
Kind Code:
B2
Abstract:
A hydroxyl-containing monomer of formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are monovalent C 1 -C 15 hydrocarbon groups, or R 2 and R 3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.
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Inventors:
Tsuyoshi Kanao
Masaki Ohashi
Koji Hasegawa
Takeshi Watanabe
Masaki Ohashi
Koji Hasegawa
Takeshi Watanabe
Application Number:
JP2008069020A
Publication Date:
February 02, 2011
Filing Date:
March 18, 2008
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F20/28; C07C69/003; C07C69/54; G03F7/039; H01L21/027
Domestic Patent References:
| JP2004086020A | ||||
| JP2004219822A | ||||
| JP2003066596A | ||||
| JP2003114522A |
Foreign References:
| US3470124 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa