Title:
マスクおよびその製造方法と半導体装置の製造方法
Document Type and Number:
Japanese Patent JP4655411
Kind Code:
B2
Inventors:
Masaki Yoshizawa
Application Number:
JP2001151159A
Publication Date:
March 23, 2011
Filing Date:
May 21, 2001
Export Citation:
Assignee:
ソニー株式会社
International Classes:
H01L21/027; G03F1/20; G03F7/20
Domestic Patent References:
| JP55018604A | ||||
| JP63110635A | ||||
| JP4073650A | ||||
| JP6120126A | ||||
| JP7254553A | ||||
| JP8315760A | ||||
| JP8330209A | ||||
| JP9162096A | ||||
| JP9213620A | ||||
| JP9265930A | ||||
| JP10135104A | ||||
| JP10207044A | ||||
| JP10261584A | ||||
| JP10268506A | ||||
| JP10275773A | ||||
| JP10289851A | ||||
| JP11031655A | ||||
| JP11054409A | ||||
| JP11354057A | ||||
| JP2000021729A |
Other References:
Gregory R. Bogart, Anthony E. Novembre, Avi Kornblit, Milton L. Peabody, Jr., Reginald C. Farrow, Myrtle I. Blakey, Richard J. Kasica, James A. Liddle, Thomas E. Saunders, Chester S. Knurek, and Ian R. Johnston,200-mm SCALPEL mask development,Proceedings of SPIE,1999年 3月15日,Vol.3676,pp. 171-177
Isao Amemiya, Kazuhiro Ohhashi, S. Yasumatsu, Shigekazu Matsui, and Osamu Nagarekawa,Silicon projection mask-making technology for e-beam lithography,Proceedings of SPIE,Vol.3096,pp.251-259
Takao Utsumi ,Low energy electron-beam proximity projection lithography: Discovery of a missing link,Journal of Vacuum Science & Technology B / Browse Journal / ,1999年,Volume 17, Issue 6,pp.2897-2902
Isao Amemiya, Kazuhiro Ohhashi, S. Yasumatsu, Shigekazu Matsui, and Osamu Nagarekawa,Silicon projection mask-making technology for e-beam lithography,Proceedings of SPIE,Vol.3096,pp.251-259
Takao Utsumi ,Low energy electron-beam proximity projection lithography: Discovery of a missing link,Journal of Vacuum Science & Technology B / Browse Journal / ,1999年,Volume 17, Issue 6,pp.2897-2902
Attorney, Agent or Firm:
Takahisa Sato