Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4667433
Kind Code:
B2
Abstract:
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) for holding a substrate (1) said substrate holder (2) provided with means to provide a holding force for pressing the substrate against the substrate holder; releasing means (4) for ejecting said substrate (1) from said holder (2) against said holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. According to the invention, the lithographic projection apparatus comprises a controller (5) for controlling said releasing means (4) so as to release said substrate (1) from said holder (2) with a release force that is reduced preceding to final release.
Inventors:
Cohen Jacobs Johannes Maria Tsar
Tyarco Adrien Rudolph Van Emper
Ashwin Rodewiyuk Hendrix Johannes van Meer
Yang Line Meadema
Yost Jeroen Ottens
Tyarco Adrien Rudolph Van Emper
Ashwin Rodewiyuk Hendrix Johannes van Meer
Yang Line Meadema
Yost Jeroen Ottens
Application Number:
JP2007220695A
Publication Date:
April 13, 2011
Filing Date:
August 28, 2007
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; H01L21/683; G03F7/20
Domestic Patent References:
| JP9027541A | ||||
| JP3163848A | ||||
| JP2002246450A | ||||
| JP9148419A | ||||
| JP11233601A | ||||
| JP11260897A | ||||
| JP11069855A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki