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Title:
赤外線低反射加工織編物
Document Type and Number:
Japanese Patent JP4668603
Kind Code:
B2
Abstract:

To provide a camouflage processed woven or knitted fabric which can achieve an objective infrared light region reflectance without deteriorating the hand of the fabric.

A method for producing a camouflage processed woven or knitted fabric comprises plainly dyeing a woven or knitted fabric comprising polyamide fibers or a woven or knitted fabric comprising polyester fibers and containing polyamide fibers uniformly distributed in the woven or knitted fabric with a sulfur dye not containing a sulfide and a reducing agent and not having the double bond of sulfur to obtain the woven or knitted fabric exhibiting an infrared light reflectance of ≤65% in an infrared light wavelength region of 600 to 1,200 nm, and further dyeing the woven or knitted fabric comprising the polyamide fibers with an acidic dye and a pigment or dyeing the woven or knitted fabric comprising the polyester fibers and containing the polyamide fibers uniformly distributed in the woven or knitted fabric with a disperse dye and a pigment into a camouflage pattern exhibiting infrared light reflectance at multi-stages.

COPYRIGHT: (C)2006,JPO&NCIPI


Inventors:
Hiromichi Ishimura
Kingo Tanaka
Application Number:
JP2004373668A
Publication Date:
April 13, 2011
Filing Date:
December 24, 2004
Export Citation:
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Assignee:
SEIREN CO.,LTD.
International Classes:
D06P3/82; C09K3/00; D03D11/00; D04B1/00; D06P1/30; D06P3/04; D06P5/00
Domestic Patent References:
JP2001055669A
JP2004346453A
JP2003166182A
JP5222682A
JP5060496A
JP2006013802A
JP2000265308A
JP7157980A
JP2005536660A
Attorney, Agent or Firm:
Takehiko Saito
Yasuyuki Hata