Title:
基板処理装置
Document Type and Number:
Japanese Patent JP4688741
Kind Code:
B2
Abstract:
A substrate treating apparatus for drying substrates by moving the substrates out of a treating liquid into a solvent atmosphere. The apparatus includes a treating tank for storing the treating liquid, a chamber enclosing the treating tank, a holding mechanism for holding the substrates, the holding mechanism being vertically movable between a treating position in the treating tank and a drying position in the chamber and above the treating tank, a supply device for supplying vapor of a solvent into the chamber, a buffer tank disposed outside the chamber for collecting the treating liquid discharged from the treating tank, a first vacuum pump for decompressing the chamber, a second vacuum pump for decompressing the buffer tank, and a controller for operating the supply device to fill the chamber with the solvent atmosphere, operating the holding mechanism to move the substrates from the treating position to the drying position, operating the first vacuum pump to decompress the chamber to a first pressure, and operating the second vacuum pump to adjust a pressure in the buffer tank to a second pressure equal to or lower than the first pressure before the treating liquid in the treating tank is discharged into the buffer tank.
Inventors:
Tomoaki Aihara
Application Number:
JP2006175331A
Publication Date:
May 25, 2011
Filing Date:
June 26, 2006
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/304; H01L21/306
Domestic Patent References:
| JP7335601A | ||||
| JP2003273061A | ||||
| JP2002350049A | ||||
| JP6163508A | ||||
| JP2002110621A |
Attorney, Agent or Firm:
Tsutomu Sugiya