Title:
スパッタ・デポジション工程を制御するためのシステムおよび方法
Document Type and Number:
Japanese Patent JP4694833
Kind Code:
B2
Abstract:
A method and apparatus for sputter deposition in which both a pulsed DC power supply and an RF power supply apply power to the target in the sputter deposition equipment. The pulsed DC power supply provides an on cycle where power is applied to the target, and an off cycle, in which a reverse polarity is applied to the target. The application of the reverse polarity has the effect of removing any charge that may have built up on the surface of the target. This reduces the likelihood of arcing occurring on the surface of the target, which can degrade the quality of the film being deposited on the substrate. By applying RF power simultaneously with the pulsed DC power to the target, the ionization efficiency on the target surface is increased. This results in a greater amount of material being removed from the target surface more quickly.
Inventors:
Stwell, Mikle, Doublet, Junia
Application Number:
JP2004505405A
Publication Date:
June 08, 2011
Filing Date:
May 16, 2003
Export Citation:
Assignee:
Applied, Materials, Ink
International Classes:
C23C14/34; C23C14/35; H05H1/46; H01J37/34
Domestic Patent References:
| JP11092925A | ||||
| JP2001262355A | ||||
| JP2002504187A | ||||
| JP11158620A | ||||
| JP9137271A | ||||
| JP11006063A | ||||
| JP2002503289A |
Attorney, Agent or Firm:
Yuzo Sanada
Ohara Shizuo
Ohara Shizuo