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Patent Searching and Data


Title:
電界効果型有機トランジスタの製造方法
Document Type and Number:
Japanese Patent JP4700976
Kind Code:
B2
Abstract:

To provide a manufacturing method for a field effect organic transistor having high mobility and small threshold variation.

This manufacturing method for the field effect organic transistor comprises the steps of forming a source electrode 2, a drain electrode 3, and an organic semiconductor layer 4 on a first substrate 1; peeling off the first substrate 1 from the organic semiconductor layer 4 after forming a second substrate 5 on the organic semiconductor layer 4; and forming a gate insulating layer 6 and a gate electrode 7 on the peel surface of the organic semiconductor layer 4.

COPYRIGHT: (C)2006,JPO&NCIPI


Inventors:
Nakagawa Taira
Shinichi Nakamura
Application Number:
JP2005034991A
Publication Date:
June 15, 2011
Filing Date:
February 10, 2005
Export Citation:
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Assignee:
Canon Inc
International Classes:
H01L21/336; H01L21/02; H01L27/12; H01L29/786; H01L51/05; H01L51/40
Domestic Patent References:
JP20029290A
JP2003229435A
JP2003258264A
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa