Title:
多結晶シリコンの製造方法及びこれに用いる反応炉
Document Type and Number:
Japanese Patent JP4708505
Kind Code:
B2
Inventors:
Tadashi Ogasawara
Application Number:
JP2010524287A
Publication Date:
June 22, 2011
Filing Date:
December 24, 2009
Export Citation:
Assignee:
Tadashi Ogasawara
International Classes:
C01B33/033
Domestic Patent References:
JP2004010472A | ||||
JP11011925A | ||||
JP2002102601A |
Foreign References:
CN101186299A |
Attorney, Agent or Firm:
Koji Kitamura
Toshio Takao
Toshio Takao