Title:
マスクパターン評価方法及び評価装置
Document Type and Number:
Japanese Patent JP4709639
Kind Code:
B2
Abstract:
According to an aspect of the invention, there is provided a photomask evaluation method including, acquiring a pattern image of a photomask, generating sidewall angle data on the sidewall angle of a pattern from the pattern image, extracting a pattern outline from the pattern image to generate outline data, and running a lithographic simulation on the basis of the outline data and the sidewall angle data to calculate an exposure margin.
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Inventors:
Masamitsu Ito
Application Number:
JP2005357935A
Publication Date:
June 22, 2011
Filing Date:
December 12, 2005
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F1/84; G03F1/86; G03F7/20; H01L21/027
Domestic Patent References:
| JP7175204A | ||||
| JP2000258352A | ||||
| JP2003207879A | ||||
| JP2003255509A | ||||
| JP2003324041A | ||||
| JP2003525529A | ||||
| JP2004158478A | ||||
| JP2004330310A | ||||
| JP2005189491A | ||||
| JP2005285898A |
Attorney, Agent or Firm:
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Sadao Muramatsu
Ryo Hashimoto