Title:
コイル埋設構造体の形成方法、磁気記録ヘッドの製造方法、およびフォトレジスト層の形状制御方法
Document Type and Number:
Japanese Patent JP4712275
Kind Code:
B2
Abstract:
A method for forming at least two layers of electrical coils and their supportive resistive layers for a magnetic write head having an ultra-short yoke so that the second and any additional coil layers are formed on flat resistive surfaces to eliminate problems associated with inter- and intra-layer shorting and with shorting between coil and yoke. The resistive layers are formed with flat surfaces and desired apex angles by using a novel two-step photoresist scheme in which a layer of photoresist is first photoexposed and developed, then photoexposed a second time to cure a surface region that will remain flat during a final low temperature curing process.
Inventors:
Zheng Yi
Liu Yongyi
Liu Yongyi
Application Number:
JP2002294114A
Publication Date:
June 29, 2011
Filing Date:
October 07, 2002
Export Citation:
Assignee:
Headway Technologies, Inc.
International Classes:
G11B5/31; G11B5/17
Domestic Patent References:
| JP461611A | ||||
| JP63285716A | ||||
| JP1128214A | ||||
| JP11283214A |
Attorney, Agent or Firm:
Yasushi Santanzaki