Title:
マイクロリソグラフィ投影露光設備のための照明系
Document Type and Number:
Japanese Patent JP4717813
Kind Code:
B2
Abstract:
An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
Inventors:
Yes Kahler
Johannes Van Cler
Marx Blotzack
Vohlgang Zinger
Damian Fiorca
Manfred Maul
Johannes Van Cler
Marx Blotzack
Vohlgang Zinger
Damian Fiorca
Manfred Maul
Application Number:
JP2006525782A
Publication Date:
July 06, 2011
Filing Date:
September 13, 2004
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2003022967A | ||||
| JP11003849A | ||||
| JP2002231619A |
Foreign References:
| US20020136351 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi