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Title:
電界効果型トランジスタ、その製造方法及び画像表示装置
Document Type and Number:
Japanese Patent JP4723787
Kind Code:
B2
Abstract:

To provide a field effect transistor which can be manufactured simply and inexpensively, obtain a large on/off ratio by attaining improvement of on-current and reduction of off-current at the same time, and to provide its manufacturing method and image display.

The field effect transistor is composed of at least a semiconductor layer 106, a first gate electrode 108 formed via a first insulating film 107 on the side of one surface of the semiconductor layer 106, and source-drain electrodes 104 and 105. The semiconductor layer 106 is located between the source-drain electrodes 104 and 105, and has a region in thinner film thickness than that of the other region in at least a partial region facing the first gate electrode 108.

COPYRIGHT: (C)2004,JPO


Inventors:
Keiichi Akamatsu
Mori Shigeyasu
Akihito Yoshida
Application Number:
JP2002200268A
Publication Date:
July 13, 2011
Filing Date:
July 09, 2002
Export Citation:
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Assignee:
Sharp Corporation
International Classes:
G02F1/1368; H01L29/786; H01L21/336; H01L51/00; H01L51/05
Domestic Patent References:
JP9083040A
JP61044468A
JP4188770A
JP9171197A
JP10256561A
JP3084963A
JP1094670A
JP2002033485A
JP5206464A
JP2003249658A
JP2001352076A
JP6163900A
Foreign References:
WO2001095384A1
Attorney, Agent or Firm:
Shintaro Nogawa