Title:
還元剤改質装置およびこれを用いた排気ガス浄化装置
Document Type and Number:
Japanese Patent JP4730216
Kind Code:
B2
Abstract:
A reforming device includes a reforming part that subjects a hydrocarbon-based raw material to be reformed to a reforming reaction to form a reducing agent to be supplied to a reducing catalyst for reducing nitrogen oxide selectively. The reforming part has a reforming reaction region through which the raw material to be reformed passes and is reacted with supplied hydrogen atoms supplied so as to be reformed to the reducing agent. For example, a hydrogen permeable membrane having a first surface and a second surface may be provided in the reforming part to permeate hydrogen atoms from the first surface to the second surface and to produce the hydrogen atoms on the second surface. The reforming device can be suitably used for an exhaust gas control system for cleaning exhaust gas, for example.
Inventors:
Iwase Katsunori
Tetsuo Toyama
Shigeru Oyanagi
Yoshiaki Nishijima
Masahiro Okajima
Tetsuo Toyama
Shigeru Oyanagi
Yoshiaki Nishijima
Masahiro Okajima
Application Number:
JP2006156236A
Publication Date:
July 20, 2011
Filing Date:
June 05, 2006
Export Citation:
Assignee:
株式会社デンソー
International Classes:
F01N3/08; B01D53/22; B01D53/94; C01B3/04; C01B3/38; F01N3/24; F01N3/28
Domestic Patent References:
| JP2004251196A | ||||
| JP2003529012A |
Attorney, Agent or Firm:
Yoji Ito
Takahiro Miura
Fumihiro Mizuno
Takahiro Miura
Fumihiro Mizuno