Title:
炭素含有層の付着強化と酸化最小限化のためのプラズマ処理
Document Type and Number:
Japanese Patent JP4738568
Kind Code:
B2
Abstract:
The present invention generally provides improved adhesion and oxidation resistance of carbon-containing layers without the need for an additional deposited layer. In one aspect, the invention treats an exposed surface of carbon-containing material, such as silicon carbide, with an inert gas plasma, such as a helium (He), argon (Ar), or other inert gas plasma, or an oxygen-containing plasma such as a nitrous oxide (N2O) plasma. Other carbon-containing materials can include organic polymeric materials, amorphous carbon, amorphous fluorocarbon, carbon containing oxides, and other carbon-containing materials. The plasma treatment is preferably performed in situ following the deposition of the layer to be treated. Preferably, the processing chamber in which in situ deposition and plasma treatment occurs is configured to deliver the same or similar precursors for the carbon-containing layer(s). However, the layer(s) can be deposited with different precursors. The invention also provides processing regimes that generate the treatment plasma and systems which use the treatment plasma. The carbon-containing material can be used in a variety of layers, such as barrier layers, etch stops, ARCs, passivation layers, and dielectric layers.
Inventors:
Judy H. Fan
Application Number:
JP2000183477A
Publication Date:
August 03, 2011
Filing Date:
June 19, 2000
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/302; H01L21/3065; C23C16/32; C23C16/56; H01L21/205; H01L21/3105; H01L21/314; H01L21/316; H01L21/768
Domestic Patent References:
| JP6120152A | ||||
| JP5500883A | ||||
| JP11503567A | ||||
| JP6263569A | ||||
| JP8051072A | ||||
| JP9197694A |
Attorney, Agent or Firm:
Sonoda Yoshitaka
Kobayashi Yoshinori
Kobayashi Yoshinori